Artist: Nidia Dias
REDSHIFT
WHAT’S NEW
Since the release of version 3.5 we’ve included Random Walk and Volumetric Anisotropy; two long-awaited features that give artists the ability to achieve a wider range of looks with their renders, bringing the quality of their imagery to the next level of realism.
Redshift now supports the native Cinema 4D Material Stacking and UV Projection workflow. This allows artists to quickly and easily layer materials or place decals in an artist-friendly fashion.
Improvements have been made to transmission energy conservation giving artists more realistic physically accurate refractive materials, improving the overall look of your renders
VIEW ALL FEATURES
ARTIST: NIDIA DIAS
ARTIST: DIMA FLOOD
ARTIST: SHKUMBIN FERIZI FROM PULLA STUDIO
ARTIST: JEAN-MICHEL BIHOREL
ARTIST: CAN ERDUMAN
ARTIST: BETTINA VÖRÖSS
ARTIST: PASHA MOTORIN
ARTIST: HIROKAZU YOKOHARA